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MICRO-CHEM SU-8 Developer 顯影劑光(guāng)刻膠
microchemSU-8Developer顯影劑Microchem SU-8 developer顯影劑是一個(gè)高(gāo)對(duì)比度，環氧基光(guāng)刻膠專為(wèi)微(wēi)加工(gōng)和(hé)微(wēi)電(diàn)子(zǐ)等的(de)應用需要的(de)厚膠，化(huà)學和(hé)熱穩定的(de)圖像.入有(yǒu)需要具【詳細】
MICRO-CHEM SU-8 3050 光(guāng)刻膠
SU-8 3050 is a high contrast, epoxy based photoresist designed for micromachining and other microele【詳細】
MICRO-CHEM SU-8 3035 光(guāng)刻膠
SU-8 3035 is a high contrast, epoxy based photoresist designed for micromachining and other microele【詳細】
MICRO-CHEM SU-8 3025
SU-8 3025 is a high contrast, epoxy based photoresist designed for micromachining and other microele【詳細】
MICRO-CHEM SU-8 3010
SU-8 3010 is a high contrast, epoxy based photoresist designed for micromachining and other microele【詳細】
MICRO-CHEM SU-8 2050
SU-8 2050 is a high contrast, epoxy based photoresist designed for micromachining and other microele【詳細】
MICRO-CHEM SU-8 2015
SU-8 2015 is a high contrast, epoxy based photoresist designed for micromachining and other microele【詳細】
MICRO-CHEM SU-8 2002
SU-8 2002 is best suited for permanent applications where it is imaged, cured and left on the device【詳細】
MICRO-CHEM SU-8 2010
SU-8 2010 is a high contrast, epoxy based photoresist designed for micromachining and other microele【詳細】
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